Advanced Energy MDX Pinnacle Power Supply is widely used in the semiconductor industry, especially for plasma processes such as *coating* and *sputtering*. This device is popular for its ability to precisely adjust voltage and manage electric arcs to improve process quality and reduce potential breakdowns. **New proposed application** for this power source can be in *production of advanced materials* such as **nanomaterials**. In processes such as *ion implantation* or *plasma-enhanced chemical vapor deposition (PECVD)*, which are used to make advanced nanomaterials or thin films, this device can play an effective role. Due to the high precision and stable voltage control, this power supply is able to be effective in producing materials with precise nanoscale structures, especially in *photonic* and *optoelectronics* industries. In addition, due to the increased capabilities of these devices such as better management of arcs and DC pulse performance, it can also be used to improve the *manufacturing processes of solar cells* and **high quality displays**. This power supply can help produce uniform dielectric films with high efficiency, which is very important in these industries. These applications can help to expand the scope of use of MDX Pinnacle* power supply in new areas and take its use beyond traditional industries such as CD production and semiconductors.

Power supply Advanced Energy MDX Pinnacle 3152352-103C It is an advanced power supply for industrial applications, especially used in thin film deposition and plasma coating processes. It operates on a three-phase 400VAC input and offers **8 kW** output power, making it suitable for heavy-duty applications in industries such as semiconductor manufacturing and other applications that require precise power control. The key features of this device include the following: 1. **High Efficiency**: Efficiency over 87% and power factor over 0.90 for loads over 2kW. 2. **multipurpose output**: the ability to function as a source of voltage, current or power, which provides the possibility of use in various processes. 3. **Precise Control**: This device has the ability to program output limits, manage arcs (sudden electric welds) and adjust processing instructions, leading to improved quality and stability in processes. 4. **LOW NOISE AND ADVANCED ARC MANAGEMENT**: Using advanced technology, output voltage noise is minimized and features such as **TCC** (Target Preparation Cycle) mode are employed to manage arcs for more consistent performance. be 5. **Compliance with standards**: This device complies with safety and electromagnetic (EMC) standards and has the CE mark, which guarantees compliance with safety and performance guidelines. These sputtering applications** are used to create thin films and coat various materials, where power stability is critical to product quality